Nitretação a plasma de zircônia estabilizada com ítria: um estudo comparativo

Authors

DOI:

https://doi.org/10.18226/23185279.v5iss1p18

Abstract

Este trabalho apresenta a investigação experimental da nitretação da zircônia parcialmente estabilizada com ítria (3% mol), utilizando dois diferentes métodos de nitretação: i) nitretação a plasma por radiofrequência e ii) nitretação por indução eletromagnética, através de um forno de indução de alta frequência. As características morfológicas e físico-químicas da camada resultante do processo de nitretação a plasma foram analisadas por diferentes técnicas, tais como espectroscopia de retroespalhamento Rutherford e difração de raios X e análise química por espectroscopia Raman e Espectroscopia de fotoelétrons excitados por raios X. A estrutura da camada nitretada a plasma é complexa, sendo composta de zircônia tetragonal e cúbica, bem como de oxinitreto de zircônio. Este artigo descreve uma comparação entre duas técnicas de nitretação para determinar a eficiência de cada método. A técnica de nitretação a plasma por radiofrequência foi mais efetiva que por indução eletromagnética devido a incorporação de nitrogênio na matriz da zircônia.

 

http://dx.doi.org/10.18226/23185279.v5iss1p18

Author Biography

Cesar Aguzzoli, Universidade de Caxias do Sul

possui graduação em Engenharia Química pela Universidade de Caxias do Sul (2005). Mestrado em ciência dos materiais pela Universidade de Caxias do Sul e doutorado em ciência dos materiais pela Universidade Federal do Rio Grande do Sul. Tem experiência na área de Engenharia de Materiais e Metalúrgica, atuando principalmente nos seguintes temas: engenharia de superfícies, nitretação a plasma e filmes finos.

References

T-J. Chung, J-S. Lee and D-Y. Kim, “Surface nitridation of yttria doped tetragonal zirconia polycrystals (Y-TZP): Microstructural evolution and kinetics,” J. Am. Ceram. Soc. 82, 3193, 1999.

R. Sharma, D. Naedele and E. Schweda, “In situ studies of nitridation of zirconia (ZrO2),” Chem. Mater. 13, 4014, 2001.

M. Lerch, “Nitridation of zirconia,” J. Am. Ceram. Soc. 79, 2641, 1996.

J. Wrba and M. Lerch, “Phase relationships in the ZrO2-rich part of the systems Y-Zr-N-O, Ca-Zr-N-O, and Mg-Zr-N-O up to temperatures of 1150°C,” J. Eur. Ceram. Soc. 18, 1787, 1998.

T-J. Chung, J-S. Lee, D-Y. Kim, G-H. Kim and H. Song, “Morphology and phase stability of nitrogen-partially stabilized Zirconia (N-PSZ),” J. Am. Ceram. Soc. 84, 172, 2001.

Y.P. Kathuria, “Laser surface nitriding of yttria stabilized tetragonal zirconia,” Surf. Coat. Technol. 201, 5865, 2007.

B. Fu and L. Gao, “Synthesis of nano crystalline zirconium nitride powders by reduction-nitridation of zirconium oxide,” J. Am.Ceram. Soc. 87, 696, 2004.

Y.P. Kathuria, “Physical aspects of laser nitriding of yttria stabilizedt-zirconia,” Appl. Surf. Sci. 254, 937, 2007.

T. Delachaux, C. Hollenstein, F. Levy and C. Verdon, “Nitriding of tetragonal zirconia in a high current D.C. plasma source,” Thin Solid Films 425, 113, 2003.

R. Milani, R.P. Cardoso, T. Belmonte, C.A. Figueroa, C.A. Perottoni, J.E. Zorzi, G.V. Soares and I.J.R. Baumvol, “Nitriding of yttria-stabilized Zirconia in atmospheric pressure microwave plasma,” J. Mater. Res. 24, 2021, 2009.

G. Deghenghi, T.-J. Chung and V. Sergo, “Raman investigation of the nitridation of yttria-stabilized tetragonal zirconia,” J. Am. Ceram Society, 86, 169, 2003.

M.M. Lucchese, “Nucleação e crescimento de filmes de diamante em substratos de zircônia parcialmente estabilizada,” Tese (Doutorado em Ciências), Universidade Federal de Rio Grande do Sul, Porto Alegre, 2006.

R. Stevens, Zirconia and Zirconia ceramics, Twicheham: Mag. Elek., 1986.

J. Chevalier and L. Gremillard, “Ceramics for medical applications: A picture for the next 20 years,” J. Eur. Ceram. Soc. 29, 1245, 2009.

S. Niyomsoan, W. Grant, D.L. Olson and B. Mishra, “Variation of color in titanium and zirconium nitride decorative thin films,” Thin Solid Films 415, 187, 2002.

G.L.N. Reddy, J.V. Ramana, S. Kumar, S.V. Kumar and V.S. Raju, “Investigations on the oxidation of zirconium nitride films in air by nuclear-reaction analysis and backscattering spectrometry,” Appl. Surf. Sci. 253, 7230, 2007.

M.A. Auger, J.J. Araiza, C. Falcony, O. Sa´nchez and J.M. Albella, “Hardness and tribology measurements on ZrN coatings deposited by reactive sputtering technique,” Vacuum 81, 1462, 2007.

D. Jianxin, L. Jianhua, Z. Jinlong, S. Wenlong and N. Ming, “Friction and wear behaviors of the PVD ZrN coated carbide in sliding wear tests and in machining processes,” Wear 264, 298, 2008.

E. Ariza, L.A. Rocha, F. Vaz, L. Cunha, S.C. Ferreira, P. Carvalho, L. Rebouta, E. Alves, Ph. Goudeau and J.P. Rivière, “Corrosion resistance of ZrNxOy thin films obtained by rf reactive magnetron sputtering,” Thin Solid Films 469–470, 274, 2004.

H.J. Ramos and N.B. Valmoria, “Thin-film deposition of ZrN using a plasma sputter type negative ion source,” Vacuum 73, 549, 2004.

J.-H. Huang, K.-H. Chang and G.-P. Yu, “Synthesis and characterization of nanocrystalline ZrNxOy thin films on Si by ion plating,” Sur. Coat. Technol. 201, 6404, 2007.

Y.-C. Chieh, W.-Z. Lo and F.-H Lu, “Microstructure evolution of ZrN films annealed in vacuum,” Sur. Coat. Technol. 200, 3336, 2006.

R. Caruso, B.J. Gómez, O. de Sanctis, J. Feugeas, A. Díaz-Parralejo and F. Sánchez-Bajo, “Ion nitriding of zirconia coated on stainless steel: Structure and mechanical properties,” Thin Solid Films 468, 142, 2004.

Y-B. Cheng and D.P. Thompson, “Role of anion vacancies in nitrogen-stabilized zirconia,” J. Am. Ceram. Soc. 76, 683, 1993.

S.H. Mohamed, A.M.A. El-Rahman and M.R. Armed, “Investigation of zirconium oxynitride thin films deposited by reactive pulsed magnetron sputtering,” J. Phys. D: Appl. Phys. 40, 7057, 2007.

F. Vaz, P. Carvalho, L. Cunha, L. Rebouta, C. Moura, E. Alves, A.R. Ramos, A. Cavaleiro, P. Goudeau and J.P. Rivière, “Property change in ZrNxOy thin films: Effect of the oxygen fraction and bias voltage,” Thin Solid Films 469–470, 11, 2004.

H. Yamamura, M. Yamamoto and K. Kakinuma, “Synthesis of ZrN thin film by a new carbothermal nitridation method of solgel derived ZrO2,” J. Ceram. Soc. Jpn. 113, 458, 2005.

A. Mitsuo, T. Mori, Y. Setsuhara, S. Miyake and T. Aizawa, “Mechanical properties of zirconium films prepared by ion-beam assisted deposition,” Nucl. Instrum. Methods Phys. Res., Sect. B206, 366, 2003.

A. Rizzo, M.A. Signore, L. Mirenghi and E. Serra, “Properties of ZrNx films with x > 1 deposited by reactive radiofrequency magnetron sputtering,” Thin Solid Films 515, 1307, 2006.

SIMNRA Home Page. Disponível em: http://www.simnra.com. Acesso em 04/02/2016.

A.L. Ortiz, A. Díaz-Parralejo, O. Borrero-López and F. Guiberteau, “Effect of íon nitriding on the crystal structure of 3 mol% Y2O3-doped ZrO2 thin-films prepared by the sol-gel method,” Appl. Surf. Sci. 252, 6018, 2006.

B.J. Gómez,R. Caruzo, L. Nachez, J. Díaz-Parralejo, J. Feugeas and O. de Sanctis, “Influence of ion nitriding process on the properties of zirconia coating deposited on stainless steel,” Braz. J. Phys. 36, 1000, 2006.

A.D. Mazzoni and E.F.Aglietti, “The formation of ZrX (O-N-C) phase by the carbonitriding of zircon at high temperatures,” Mater. Chem. Phys. 65, 166, 2000.

A.D. Mazzoni and M.S. Conconi, “Study of carbonitriding reactions of Zirconia.Synthesis of Zr(C,N,O) phases and β-type zirconium oxynitrides,” Ceram. Inter. 30, p. 23, 2004.

I. Milošev, H.-H. Strehblow, M. Gaberššek and B. Navinšek, “Electrochemical Oxidation of ZrN Hard (PVD) Coatings Studied by XPS,” Surf. Interface Anal. 24, 448, 1996.

A. Rizzo, M.A. Signore, L. Mirenghi, E. Piscopiello and L. Tapfer, “Physical properties evolution of sputtered zirconium oxynitride films: effects of the growth temperature,” J. Phys. D: Appl. Phys. 42, 235401, 2009.

I. Bertóti, “Characterization of nitride coatings by XPS,” Sur. Coat. Technol. 151 –152, 194–203, 2002.

D. Roman, J. Bernardi, C.L.G. de Amorim, F.S. de Souza, A. Spinelli, C. Giacomelli, C.A. Figueroa, I.J.R. Baumvol and R.L.O. Basso, “Effect of deposition temperature on microstructure and corrosion resistance of ZrN thin films deposited by DC reactive magnetron sputtering,” Mater. Chem. Phys. 130, 147–153, 2011.

G.I. Cubillos, M. Bethencourt, J.J. Olaya, J.E. Alfonso and J.F. Marco, “The influence of deposition temperature on microstructure and corrosion resistance of ZrOxNy/ZrO2 coatings deposited using RF sputtering,” Appl. Surf. Sci. 309, 181–187, 2014.

H. Baránková and L. Bárdos, “Hollow cathode and hybrid plasma processing,” Vacuum. 80, 688, 2006.

H. Baránková and L. Bárdos, “Hollow cathode atmospheric pressure plasma sources for surface treatment,” Surf. Coat. Technol. 174-175, 63, 2003.

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Published

2017-08-10

How to Cite

Molossi, M., Catafesta, J., Figueroa, C. A., & Aguzzoli, C. (2017). Nitretação a plasma de zircônia estabilizada com ítria: um estudo comparativo. Scientia Cum Industria, 5(1), 18–25. https://doi.org/10.18226/23185279.v5iss1p18

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Science, Education and Engineering