Low Energy Ion Implanting of Silver Ion in Titanium

Authors

  • Fernanda Elisa Demore Palandi
  • Fernando Graniero Echeverrigaray Universidade de Caxias do Sul
  • Cesar Henrique Wanke Universidade de Caxias do Sul
  • Carlos Alejandro Figueroa Universidade de Caxias do Sul
  • Israel Jacob Rabin Baumvol Universidade de Caxias do Sul
  • Cesar Aguzzoli Universidade de Caxias do Sul

DOI:

https://doi.org/10.18226/23185279.v2iss1p26

Abstract

In modern medicine, biomaterials have been widely used as implants. Among biomaterials, titanium medical class is distinguished by its high degree of biocompatibility. However, orthoses and prostheses infected with post-implanted microorganisms require surgeries and medical interventions that are costly and treatment can take months. To combat infections associated with implants, the best strategy is to prevent them from occurring. One strategy is the silver ion implantation in titanium. In this work, silver ions were implanted at low energies (4 keV) in medical titanium with the goal to take bactericide titanium surface and therefore, inhibit biofilm formation. The implantation was done using the Ion Plating equipment. After ion implantation, the samples were analyzing for Rutherford Backscattering Spectrometry, Glow-Discharge Optical Emission Spectroscopy and X-Ray Diffraction. The results show that the silver was implanted at depths up to 10 nm, corroborating simulation data. In addition, the strategy used in this work can be applied on an industrial scale due to the type of equipment used for the surface treatment.

 

http://dx.doi.org/10.18226/23185279.v2iss1p26

Published

2014-05-26

How to Cite

Palandi, F. E. D., Echeverrigaray, F. G., Wanke, C. H., Figueroa, C. A., Baumvol, I. J. R., & Aguzzoli, C. (2014). Low Energy Ion Implanting of Silver Ion in Titanium. Scientia Cum Industria, 2(1), 26–30. https://doi.org/10.18226/23185279.v2iss1p26

Issue

Section

Science, Education and Engineering