Oxygen reduction by plasma cleaning in low-energy ion implantation of silver ions in titanium
DOI:
https://doi.org/10.18226/23185279.v3iss1p12Abstract
In this study silver ions were implanted on titanium surface through the technique of ion implantation at low energy in a device called Ion Plating Diversified. The titanium reacts easily at room temperature forming a thin oxide layer on its surface. Which may reduce the efficiency of the process, damaging it not only by forming a barrier to implementation but also by the reaction of oxygen with silver, nullifying its bactericidal effect. To reduce the oxygen effect, a strategy was elaborated for surface cleaning to remove of this oxide prior to ion implantation. To verify the effectiveness of implantation and qualitative reduction of oxygen to physical-chemical characterization samples were evaluated. The results show that silver is actually implanted on the surface of titanium, a few nanometers in depth, as well as a qualitative reduction of oxygen on the surface. Comparing the different types of treatment it was found that the plasma cleaning can be applied prior to the implantation process, proving effective in reducing the oxygen, and also because it is a non-polluting technique.
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Copyright (c) 2015 Andreia Valim de Souza, Tatiana Pacheco Soares, Carlos Alejandro Figueroa, Cesar Aguzzoli
This work is licensed under a Creative Commons Attribution 4.0 International License.
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